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Title:
真空部品用材料、真空部品、真空装置、真空部品用材料の製造方法、真空部品の処理方法及び真空装置の処理方法
Document Type and Number:
Japanese Patent JP4829485
Kind Code:
B2
Abstract:
The present invention relates to a manufacturing method of a material for vacuum device used in a vacuum apparatus that generates ultra-high vacuum and performs processing. Its constitution has the steps of: reducing pressure around the alloy (24) of Cu and a doping element; increasing the temperature of the alloy (24) to outgas hydrogen from the alloy (24), and gathering the doping element near the surface of the alloy (24) and precipitating the doping element; and exposing the alloy (24) to single oxygen, single nitrogen, mixed gas of oxygen and nitrogen, ozone (O3), oxygen content compound, nitrogen content compound or oxygen-nitrogen content compound, or a combination of them, or a plasma thereof while the temperature of the alloy (24) is maintained at a range of room temperature or higher and the temperature of the alloy (24) increased for outgassing hydrogen or lower, whereby it is reacted with the precipitated doping element so that one of an oxide film, a nitride film and an oxide-nitride film (32) of the doping element is formed on a surface layer of the alloy (24).

Inventors:
Fumio Watanabe
Application Number:
JP2004165775A
Publication Date:
December 07, 2011
Filing Date:
June 03, 2004
Export Citation:
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Assignee:
Limited company vacuum laboratory
International Classes:
C23C8/12; C22C9/00; C22F1/02; C22F1/08; C23C8/02; C23C8/16; C23C8/24; C23C8/28; C23C8/36; C23C16/26; C23C28/04; C23C30/00
Domestic Patent References:
JP2000039375A
JP7002277A
JP7166335A
JP2254336A
JP55044509A
JP8283929A
JP62202038A
JP9111374A
JP2000274467A
JP61003876A
JP60208476A
JP11092912A
JP10265935A
JP2003268571A
JP8060250A
Foreign References:
WO2004022809A1
Other References:
塚原 園子,超高真空材料として眺めた金属材料と水素,応用物理,日本,社団法人応用物理学会,2000年 1月10日,第69巻 第1号,p.22-28
Attorney, Agent or Firm:
Keizo Okamoto



 
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