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Title:
計測または検査装置およびそれを用いた計測または検査方法
Document Type and Number:
Japanese Patent JP5478426
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an electron beam type measurement and inspection apparatus and a measurement and inspection method featuring a reduced divergence in electron beam scanning caused by a mirror body current noise.SOLUTION: A measurement or inspection apparatus includes an electron irradiation system which irradiates a subject to be inspected with an electron beam, a mirror body though which an electron beam passes until it irradiates the subject to be inspected after being emitted from the electron irradiation system, a secondary electron detection system which detects secondary electrons generated by irradiating the subject to be inspected with the electron beam which passes through the mirror body, a signal processing system which processes a signal based on the secondary electrons detected by the secondary electron detection system, and correction means which measures a current value flowing in the mirror body when the electron beam emitted from the electron irradiation system passes through the mirror body and corrects the irradiated position of the electron beam based on a relationship between the current value and a predetermined current value and a divergence in beam position.

Inventors:
Lee Wen
Makuuchi Masami
Kawano Gen
Wataru Mori
Hiroyuki Takahashi
Makoto Esumi
Application Number:
JP2010191631A
Publication Date:
April 23, 2014
Filing Date:
August 30, 2010
Export Citation:
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Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/09; H01J37/147; H01L21/66
Domestic Patent References:
JP2010015731A
JP2006258490A
JP7326314A
JP7065760A
JP2002184674A
JP2006093251A
Attorney, Agent or Firm:
Manabu Inoue
Yuji Toda
Shigemi Iwasaki



 
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