To efficiently and accurately measure dynamic optical characteristics of a projection optical system without enlargement of an optical system for measurement.
A measuring device for measuring optical characteristics of the projection optical system PL includes a test reticle TR where a plurality of phase marks 20 disposed in a Y direction are formed on an object surface, a fluorescent film 35 where a plurality of periodic patterns 39 disposed along an image surface corresponding to the phase marks 20 are formed, an FOP 37 and an image sensor 38 for detecting detection light DL generated from illumination light IL passing through the phase mark 20, the projection optical system PL, and the periodic pattern 39, and a wafer stage for integrally moving the fluorescent film 35, the FOP 37, and the image sensor 38 in a Y direction.
WO/2014/156170 | ELECTRON BEAM IRRADIATION DEVICE |
JP2008098630 | METHOD OF IMPROVING PRECISION IN OPTICAL MEASUREMENT |
JPS63115332 | MASK FOR X-RAY EXPOSURE |
NAGAYOSHI HIROYUKI
INOUE JIRO
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