To provide a method capable of maintaining accurate measurement without having to recalibrate a secondary electron multiplying element measuring system, and a vacuum processing device that precludes the operation from stopping for recalibration that accompanies changes in the measurement accuracy of the secondary electron multiplying element.
Measured values of a particle, such as a charged particle measured by the element, are multiplied with a ratio A/B of an initial intensity value A of soft X-ray intensity measured in an installation initial stage of the secondary electron multiplying element 4 installed under vacuum condition, with the intensity value B of the soft X-ray intensity measured under measuring use of the element, as a correction factor.
TAKEUCHI KIYOUKO
TSUJI YASUSHI
ARAKAWA ICHIRO
| JPH10185844A | 1998-07-14 | |||
| JPH01135331A | 1989-05-29 | |||
| JPH06331574A | 1994-12-02 | |||
| JPS63193351A | 1988-08-10 |
Shinichi Abe
Yuji Tsujida
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