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Patent Searching and Data


Title:
MEASURING APPARATUS
Document Type and Number:
Japanese Patent JPH1194787
Kind Code:
A
Abstract:

To monitor the development of a crack in a wide range of a direction, by measuring the impedances of two extended electrodes constituted so as to pass a current to a resistance layer and the impedance of the resistance layer, and measuring the size of the crack in a processed article or a test piece from the measured values.

Curved electrodes or bus bars 2 are formed on the resistance layer 1 formed on a dielectric substrate 3. A detector is mounted on a processed article or a Lest piece. In the development of the crack of the processed article or the test piece, a crack is generated in the dielectric substrate 3 and the resistance layer 1 in the same pattern as the crack pattern of the processed article or the test piece. When the crack is generated in the resistance layer, the resistance layer 1 is reduced in its cross area to be increased in its resistance. Voltage is dropped between two bus bars 2 by the impedance of the resistance layer 1 and this voltage drop corresponds to the impedance of the resistance layer 1. The voltage drop has the linearity corresponding to a crack size by the curving ratio of the bus bars 2, and is made substantially regardless of a crack developing direction.


Inventors:
ROJIYAA DEIBITSUDO TEITSUZUUER
JIYON REIMENTO NIKORUZU
Application Number:
JP21737498A
Publication Date:
April 09, 1999
Filing Date:
July 31, 1998
Export Citation:
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Assignee:
ERA PATENTS LTD
UNIV CRANFIELD
International Classes:
G01B7/02; G01L1/20; G01M5/00; G01N3/32; G01N27/20; (IPC1-7): G01N27/20; G01B7/02; G01N3/32
Attorney, Agent or Firm:
Aoyama Ryo (1 person outside)