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Title:
MEASURING METHOD FOR ELECTROMAGNETIC RADIATION
Document Type and Number:
Japanese Patent JP3403099
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To execute measurement of electromagnetic radiation and calculation of derives parameters and values easily and accurately by modulating electromagnetic radiation from a radiation source actively with characteristic parameters and correcting radiation from an object with radiation from the radiation source.
SOLUTION: Radiation from a semiconductor wafer 2 (object) and radiation from lamps (radiation source) 4, 5 reflected on the wafer 2 are measured by a wafer pyrometer (second detector) having a large incident angle and the light emitted from the lamp 5 is measured directly by a lamp pyrometer (first detector) 7 through an optical channel 8. Output signals from the wafer pyrometer and the lamp pyrometer 7 are introduced to an evaluation circuit and the modulation factors or depths of radiation are compared or associated to compensate or cancel the reflected light from the wafer 7 detected by the wafer pyrometer. According to the method, temperature, reflectivity, transmissivity and/or emissivity from the wafer 2 can be measured accurately.


Inventors:
Marx Hauf
Thomas Kunal
Heinrich Valk
Horst balthazar
Uwe Muller
Application Number:
JP34840798A
Publication Date:
May 06, 2003
Filing Date:
December 08, 1998
Export Citation:
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Assignee:
Steak Ertepe Systems Gezel Shaft Mitt Beschlenktel Haftung
International Classes:
G01J1/44; G01J5/00; G01J5/10; H01L21/26; (IPC1-7): G01J1/44; G01J5/10
Domestic Patent References:
JP7333063A
JP396839A
JP4305130A
JP8184496A
JP853766A
JP59155741A
JP8233727A
JP4191642A
JP8285773A
JP62172228A
JP7167786A
JP2124536U
JP6338139U
JP6288361U
JP5559462U
JP2504676A
Other References:
【文献】米国特許5180226(US,A)
【文献】米国特許5154512(US,A)
Attorney, Agent or Firm:
Toshio Yano (3 outside)