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Patent Searching and Data


Title:
MEDAL WASHING AND POLISHING DEVICE
Document Type and Number:
Japanese Patent JP2004187816
Kind Code:
A
Abstract:

To provide a medal washing and polishing device having a low cost mechanism which surely absorbs and removes water drops stuck to the front and back surfaces of medals after being washed and polished.

This medal washing and polishing device comprises: a medal washing and polishing part 2 for which a fixed upper brush board 2a and a lower brush board 2d rotated by a motor 2g are arranged so as to face each other at the lower part of the medal falling port 1a of a cabinet 1; a coin aligning part 3 in which the projection 3g of the height same as or lower than the thickness of the medal is formed on the carrying surface of a carrying conveyor 3f and a brush roll 3j rotated oppositely to a carrying direction is pivotally supported at an upper part such that a brush bristle tip is at the almost same height as the thickness of the medal; and a medal water absorbing part 4 for which a pair of upper and lower water absorbing rollers 4b and 4d are pivotally supported in a press contact state.


Inventors:
OYA TAKATOSHI
Application Number:
JP2002357450A
Publication Date:
July 08, 2004
Filing Date:
December 10, 2002
Export Citation:
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Assignee:
JETTER CO LTD
International Classes:
B08B1/02; B08B3/02; B08B7/04; B24B29/00; A63F7/02; (IPC1-7): A63F7/02; B08B1/02; B08B3/02; B08B7/04; B24B29/00
Attorney, Agent or Firm:
Shoshiro Toshima