Title:
膜形成方法及び膜形成装置
Document Type and Number:
Japanese Patent JP4090648
Kind Code:
B2
Abstract:
A method of forming a film of a coating solution on a substrate includes steps of moving a coating solution discharge member relative to a substrate while a coating solution is being discharged from the coating solution discharge member to the surface of the substrate, and changing a discharge direction of the coating solution to an outer peripheral portion of the substrate to make the amount of application to the outer peripheral portion smaller than that to other portions. This can reduce the amount of application to the outer peripheral portion of the substrate, thereby making it possible to restrain protuberance of the coating solution at the outer peripheral portion of the substrate caused by surface tension. Consequently, a coating film which is uniform also at the outer peripheral portion on the substrate is formed.
Inventors:
Takahiro Kitano
Shinji Kobayashi
Yukihiko Ezaki
Yuuki Morikawa
Shinji Kobayashi
Yukihiko Ezaki
Yuuki Morikawa
Application Number:
JP32880099A
Publication Date:
May 28, 2008
Filing Date:
November 18, 1999
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
B05B15/04; H01L21/027; B05C5/00; B05C13/02; B05D1/30; G03F7/16; H01L21/00; B05D1/00
Domestic Patent References:
| JP11121344A | ||||
| JP10284397A | ||||
| JP8167551A | ||||
| JP7108212A | ||||
| JP5047651A | ||||
| JP63239947A |
Attorney, Agent or Firm:
Tetsuo Kanamoto
Miaki Kametani
Koji Hagiwara
Miaki Kametani
Koji Hagiwara