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Title:
メンブレン構造素子及びその製造方法
Document Type and Number:
Japanese Patent JP4780671
Kind Code:
B2
Abstract:

To provide a membrane structure element which can be easily fabricated and has high heat insulation and high quality, and to provide a method of manufacturing the same.

In this manufacturing method, the membrane structural element is manufactured which includes a membrane formed of a silicon oxide film and a substrate for supporting the membrane in the air by supporting a part of the outer edge of the membrane. The method includes a film forming step of forming a heat-shrinkable silicon oxide film 13 on a surface of a silicon substrate 2 by plasma CVD, a heat treatment step of performing heat treatment for thermally shrinking the silicon oxide film 13 having been formed on the substrate 1, and a removal step of forming a concave portion 4 by removing a part of the substrate 2 such that a portion corresponding to the membrane in the silicon oxide film 13 is supported in the air relative to the substrate 2.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
Takayuki Hirano
Nobuyuki Kawakami
Amanaka
Application Number:
JP2007057956A
Publication Date:
September 28, 2011
Filing Date:
March 08, 2007
Export Citation:
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Assignee:
KABUSHIKI KAISHA KOBE SEIKO SHO
International Classes:
H01L21/316; G01F1/69; H01L37/00; G01J1/02
Domestic Patent References:
JP8264844A
JP4286122A
JP2005308698A
Attorney, Agent or Firm:
Honda Tatsuo