Title:
MEMS ELEMENT AND METHOD OF MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2018117206
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a MEMS element capable of achieving an improvement in sensitivity and miniaturization at the same time, and a method of manufacturing the same.SOLUTION: A MEMS element in which a movable electrode 3 and a fixed electrode 5 formed on a silicon substrate 1 are arranged via an air gap 12 includes: a first back chamber 8 comprising a region that is formed by removing the silicon substrate while a part of a movable electrode side region of the silicon substrate is left; and second back chambers 10 which are continuous to the substrate and which comprise regions partitioned by a plurality of through holes 7 in a part of the substrate having been left.SELECTED DRAWING: Figure 1
Inventors:
ARAKI SHINICHI
USUI TAKAHIDE
USUI TAKAHIDE
Application Number:
JP2017005735A
Publication Date:
July 26, 2018
Filing Date:
January 17, 2017
Export Citation:
Assignee:
NEW JAPAN RADIO CO LTD
International Classes:
H04R19/04; B81B3/00; B81C1/00; H01G5/16; H01L29/84; H04R31/00
Domestic Patent References:
| JP2015056832A | 2015-03-23 | |||
| JP2015035730A | 2015-02-19 |
Foreign References:
| US20140299948A1 | 2014-10-09 |