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Title:
METAL COMPOUND, RAW MATERIAL COMPRISING THE SAME FOR CHEMICAL VAPOR PHASE GROWTH, AND MANUFACTURING METHOD OF METAL-CONTAINING THIN FILM
Document Type and Number:
Japanese Patent JP2009173587
Kind Code:
A
Abstract:

To provide a metal compound that gives a good metal-containing thin film containing little residual carbon and allows a process exhibiting a stable film formation speed and stable controllability of the thin film composition.

The metal compound is represented by general formula (1) (wherein M is titanium, zirconium or hafnium; X is a halogen atom; and m is 1 or 2).


Inventors:
YAMADA NAOKI
YOSHINAKA ATSUYA
WADA SENJI
Application Number:
JP2008014791A
Publication Date:
August 06, 2009
Filing Date:
January 25, 2008
Export Citation:
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Assignee:
ADEKA CORP
International Classes:
C07F7/28; C23C16/34
Domestic Patent References:
JP2000036473A2000-02-02
JP2006182709A2006-07-13
JP2006045083A2006-02-16
Foreign References:
KR0156980B11998-12-01
Attorney, Agent or Firm:
Osamu Hatori



 
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