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Title:
金属膜形成用組成物および金属膜形成方法
Document Type and Number:
Japanese Patent JP6953006
Kind Code:
B2
Abstract:
Provided is a metal film forming composition comprising: a metal complex represented by general formula (1), general formula (2), or general formula (3); a counter anion of the metal complex; and a solvent of the metal complex. In general formulae (1)-(3), M1 and M3 each independently represent, a metal atom selected from a group consisting of Ag, Cu, Li, Ni, Mn, Zn, and Co, and M3 represents a metal atom selected from a group consisting of Cu, Ni, Mn, and Co. L11-L32 each independently represent, an NH3 ligand, an R1NH2 ligand,an OH2 ligand, or a diamine-derived ligand, and R1 represents an alkylene group. 1n, 1m, 3n, and 3m each independently represent, an integer of 0-8; 2n and 2m each independently represent, an integer of 0-4; 1n+1m is in the range of 4-8; 2n+2m is in the range of 2-4; 3n+3m is in the range of 2-8; and respectively represent integers determined in accordance with the valence of the metal atoms represented by M1-M3.

Inventors:
Hiromi Nagai
Mitsufumi Sato
Application Number:
JP2017565604A
Publication Date:
October 27, 2021
Filing Date:
February 01, 2017
Export Citation:
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Assignee:
Kogakuin University
International Classes:
C23C18/08; C07F1/08; C23C18/02; C23C18/14
Domestic Patent References:
JP10072673A
JP2005035984A
JP2005506901A
JP2013510241A
JP2008013466A
JP2006028525A
JP2007253352A
Foreign References:
WO2015045932A1
Attorney, Agent or Firm:
Patent Service Corporation Taiyo International Patent Office



 
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