Title:
METAL OXIDE NANOPARTICLE AND PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2015157807
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide nanoparticles useful for improving resolution of a photoresist, a photoresist composition using the nanoparticles, and a pattern forming method using the composition.SOLUTION: The nanoparticles include: a core containing a group 4 metal oxide such as HfO; and a coating that surrounds the core and comprises a ligand selected from an organic acid represented by formula (I) and its carboxylate. A new photoresist composition is provided, which comprises the above nanoparticles and a photoacid generator that generates an acid having a pKa lower than a pKa of the ligand acid upon photodecomposition. In formula (I), Rto Reach independently represent H, a 1-8C hydrocarbyl group, a halogen atom, a mercapto group, a cyano group, or the like.
Inventors:
SARMA CHANDRASEKHAR
CHRISTOPHER K OBER
EMMANUEL P GIANNELIS
SOUVIK CHAKRABARTY
CHRISTOPHER K OBER
EMMANUEL P GIANNELIS
SOUVIK CHAKRABARTY
Application Number:
JP2015027965A
Publication Date:
September 03, 2015
Filing Date:
February 16, 2015
Export Citation:
Assignee:
UNIV CORNELL
INTEL CORP
INTEL CORP
International Classes:
C07C63/08; C09K3/00; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Kenichi Morita
Kenjiro Yamaguchi
Hironori Nagayama
Yuzaki Ozaki
Kenjiro Yamaguchi
Hironori Nagayama
Yuzaki Ozaki
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