Title:
METAL PLATE EVALUATION METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
Document Type and Number:
Japanese Patent JP2023012491
Kind Code:
A
Abstract:
To provide a metal plate evaluation method used for manufacturing a vapor deposition mask.SOLUTION: A metal plate evaluation method used for manufacturing a vapor deposition mask comprises: the step of producing a test specimen by cutting a metal plate in a direction perpendicular to the longitudinal direction and plane direction of a metal plate; the trimming step of trimming the cross section of the test specimen; the step of detecting an EBSD pattern formed by irradiating the cross section of the test specimen with electron beams E from the object lens 57 of a Schottky field emission scanning electron microscope; and the analysis step of analyzing the EBSD pattern to calculate the average cross-sectional area of crystal grains appearing in the cross section of the test specimen. The analysis step includes analyzing the EBSD pattern by an area method on the conditions of recognizing a portion having a crystal orientation difference of 5 degrees or more as a crystal grain boundary.SELECTED DRAWING: Figure 9
Inventors:
Chikao Ikenaga
Chiaki Hatsuda
Hiroki Oka
Sachiyo Matsuura
Eisuke Okamoto
Ushikusa Masato
Chiaki Hatsuda
Hiroki Oka
Sachiyo Matsuura
Eisuke Okamoto
Ushikusa Masato
Application Number:
JP2022169266A
Publication Date:
January 25, 2023
Filing Date:
October 21, 2022
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/04; C25D1/10
Attorney, Agent or Firm:
Miyajima Manabu
Yukihiro Hotta
Kazuo Okamura
Yukihiro Hotta
Kazuo Okamura