METAL POLISHING LIQUID - FUJIFILM CORP

Title:

METAL POLISHING LIQUID

Document Type and Number:

Japanese Patent JP2007214518

Kind Code:

A

Abstract:

To provide a metal polishing liquid for which the performances of high polishing speed and temporal stability are made compatible by modifying a colloidal silica surface and using an absorptive compound together on the surface.

The metal polishing liquid contains a formula (I) and colloidal silica, and at least a part of silicon atoms on the colloidal silica surface is substituted by aluminum atoms. In the formula (I), R1indicates an alkyl group, an alkynyl group, an alkenyl group, an allyl group or an aryl group; R2indicates a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an allyl group, or an aryl group; and m indicates an integer ≥0 and ≤6.

Inventors:

YAMASHITA KATSUHIRO

Application Number:

JP2006035853A

Publication Date:

August 23, 2007

Filing Date:

February 13, 2006

Export Citation:

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Assignee:

FUJIFILM CORP

International Classes:

H01L21/304; B24B37/00; C09K3/14

Domestic Patent References:

JP2003197573A	2003-07-11
JP2005277248A	2005-10-06
JP2005159269A	2005-06-16
JP2005183684A	2005-07-07
JP2004123921A	2004-04-22

Foreign References:

WO2002067309A1

2002-08-29

Attorney, Agent or Firm:

Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda

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