Title:
METAL REMOVAL METHOD OF POLYSILANE COMPOUND
Document Type and Number:
Japanese Patent JP2023146618
Kind Code:
A
Abstract:
To provide: a purification method of a polysilane compound, with which a metal is efficiently removed from the polysilane compound without occurrence of new metal contamination; in addition, a purification method of a polysilane compound, with which a content of a metal component is further significantly reduced from the polysilane compound having the metal component removed with a conventional method; and further a high purity polysilane compound having a significantly reduced content of the metal component.SOLUTION: A purification method of a polysilane compound at least has a preparation step to dilute a polysilane compound containing metal impurities with a compound having at least one amide group skeleton, and a metal removal step to remove the metal impurities to the outside of the system with a metal removal treatment from the diluted polysilane compound.SELECTED DRAWING: None
Inventors:
KOSAI JUN
TANIGUCHI HIROAKI
TANIGUCHI HIROAKI
Application Number:
JP2022053884A
Publication Date:
October 12, 2023
Filing Date:
March 29, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP
International Classes:
C08G77/60; B01J39/05; B01J39/20; B01J41/05; B01J41/14; B01J45/00; B01J47/011; B01J47/04; B01J47/10
Attorney, Agent or Firm:
Patent Attorney Corporation Hanabusa Patent and Trademark Office
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