Title:
金属化
Document Type and Number:
Japanese Patent JP2005530043
Kind Code:
A
Abstract:
This invention relates to photosensitive organometallic compounds which are used in the production of metal deposits. In particular, this invention relates to photosensitive organometallic compounds such as bis-(perfluoropropyl)-1,5-cyclooctadiene platinum (II) (i.e. (C3F7)2PtC8H12) which on exposure to UV radiation and then a reduction process forms a platinum metal deposit such as a substantially continuous thin 'sheet-like' film or a substantially narrow line which is capable of electrical conduction.
Inventors:
Thomson James
Application Number:
JP2004513537A
Publication Date:
October 06, 2005
Filing Date:
June 18, 2003
Export Citation:
Assignee:
Seimig Limited
International Classes:
C23C18/08; C23C4/12; C23C18/14; C23C26/00; H01B5/14; H01B13/00; H05K3/10; (IPC1-7): C23C18/08; C23C18/14; H01B5/14; H01B13/00
Attorney, Agent or Firm:
Sadao Kumakura
Nobuo Ogawa
Atsushi Hakoda
Kenji Asai
Koji Hirayama
Nobuo Ogawa
Atsushi Hakoda
Kenji Asai
Koji Hirayama