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Title:
METHANE-RICH GAS PRODUCTION SYSTEM
Document Type and Number:
Japanese Patent JP2014198789
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a methane-rich gas production system having, as a whole system, reduced load in terms of equipment cost, energy consumption, and amount of supplied water vapor.SOLUTION: The methane-rich gas production system is constituted so that a raw material gas flows through in order of a carbon monoxide shift reaction apparatus 2, a desulfurization apparatus 3, a methanation reaction apparatus 4, and a carbon dioxide removal apparatus 5. The system comprises water vapor introduction means for introducing water vapor into the raw material gas, and a recycle path 4d for returning a portion of a gas including carbon dioxide which is transmitted from an outlet part of any of methanation reactors 4a constituting the methanation reaction apparatus 4, to an inlet part of the first-stage methanation reactor 4a with components of the gas unchanged. At an inlet part of the recycle path 4d, gas distribution means is disposed so that a gas delivered from any of the methanation reactors 4a can be supplied and the recycle gas can be distributed into the recycle path 4d.

Inventors:
TAKENAKA TSUGUTO
FUJIWARA YUKIO
YOKOYAMA KOUTA
Application Number:
JP2013074813A
Publication Date:
October 23, 2014
Filing Date:
March 29, 2013
Export Citation:
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Assignee:
OSAKA GAS CO LTD
International Classes:
C10K3/02; C01B3/16; C07C1/04; C07C9/04; C10J3/46; C10K1/16; C10K3/04
Domestic Patent References:
JPS5168502A1976-06-14
JP2012514039A2012-06-21
Foreign References:
US20100272619A12010-10-28
US4133825A1979-01-09
Attorney, Agent or Firm:
Shuichiro Kitamura
Ichiro Miyake
East Kunihiko