Title:
化合物、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6665030
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a compound, an acid generator and a resist composition, from which a resist pattern can be produced with a good mask error factor (MEF).SOLUTION: The compound is represented by the formula (I), and the acid generator and the resist composition contain the compound. In the formula (I), Qand Qeach represent F or a perfluoroalkyl group; Rand Reach represent F, a perfluoroalkyl group or the like; z represents an integer of 0 to 6; Xrepresents *-CO-O-, *-O-CO- or *-O-; Arepresents a divalent hydrocarbon group; Rrepresents a hydrocarbon group, where Aand Rmay be bonded to each other to form a ring together with a carbon atom bonded thereto; Xand Xeach represent O or S; Xrepresents a divalent saturated hydrocarbon group which may have F; Rrepresents an aromatic hydrocarbon group which may have a substituent; and Rrepresents a hydrocarbon group or a cyano group which may have a substituent.SELECTED DRAWING: None
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Inventors:
Shota Nakano
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2016102369A
Publication Date:
March 13, 2020
Filing Date:
May 23, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D321/06; C07D321/10; C09K3/00; G03F7/004; G03F7/039
Domestic Patent References:
| JP2010159243A | ||||
| JP2006517950A | ||||
| JP2004510189A | ||||
| JP2012097074A | ||||
| JP2011201866A | ||||
| JP2011033729A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation