Title:
両末端シラノール基封鎖低分子量直鎖状オルガノポリシロキサンの製造方法
Document Type and Number:
Japanese Patent JP5338738
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing a low molecular weight linear organopolysiloxane with blocked silanol groups at both ends in a high yield that gives few non-hydrolyzed residues and extremely few by-products.SOLUTION: The method for producing a low molecular weight linear organopolysiloxane with blocked silanol groups at both ends includes: a step (A) of subjecting a diorganodiacyloxysilane represented by general formula (1): SiRR(OCOR)(wherein Rand Rindicate each independently a substituted or unsubstituted monovalent hydrocarbon group; and Rindicates a 1-4C alkyl group) to partial hydrolysis and condensation reaction in cyclopentylmethyl ether in the presence of a small amount of water; a step (B) of washing a reaction mixture obtained in the step (A) with water of very excessive amount to completely carry out hydrolysis of the diorganodiacyloxysilane and to extract and remove carboxylic acid, a hydrolysis by-product from the organic phase; and a step (C) of removing the cyclopentylmethyl ether by distillation from the organic phase obtained in the step (B).
Inventors:
Kazuhiro Oishi
Toshio Yamazaki
Toshio Yamazaki
Application Number:
JP2010086173A
Publication Date:
November 13, 2013
Filing Date:
April 02, 2010
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07F7/18; C08G77/06; C08G77/16; C08G77/34
Domestic Patent References:
| JP200220489A | ||||
| JP598012A |
Foreign References:
| FR2230376A1 | ||||
| WO2009104424A1 |
Attorney, Agent or Firm:
Mamoru Ushiki
Previous Patent: JPS5338737
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