Title:
トリクロロシランを含む生成物を製造する方法
Document Type and Number:
Japanese Patent JP5153992
Kind Code:
B2
Abstract:
A reactor (100) may be used for hydrogenating tetrachlorosilane. The reactor (100) has at least one part fabricated from a silicon carbide-based material of construction. The reactor (100) may include i) a pressurizable shell (101), ii) a thermal insulator (102) surrounded by the pressurizable shell (101), iii) a heating element (106) surrounded by the thermal insulator (102), and iv) a reaction chamber (107) surrounded by the heating element (106).
Inventors:
Manoji Agrawal
Dana Bower
Robert Pippenger
Dana Bower
Robert Pippenger
Application Number:
JP2004059641A
Publication Date:
February 27, 2013
Filing Date:
March 03, 2004
Export Citation:
Assignee:
HEMLOCK SEMICONDUCTOR CORPORATION
International Classes:
B01J3/04; B01J3/00; B01J19/00; C01B33/03; B01J19/02; B01J19/24
Domestic Patent References:
| JP6293511A | ||||
| JP3056795A | ||||
| JP6206718A | ||||
| JP2003020217A |
Foreign References:
| EP1454670A1 | ||||
| US20040173597 |
Attorney, Agent or Firm:
Michiharu Soga
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order
Masahiro Taguchi
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order
Masahiro Taguchi