Title:
塩、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6757171
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt with which a resist pattern having a good focus margin can be produced.SOLUTION: Salts of an anion represented by at least one formula (Ia) and a cation represented by formula (IC) are provided. In the formulae, Xand Xeach independently represent O or S; Xrepresents a divalent saturated hydrocarbon group having at least one F; * represents a bonding site; Rand Reach independently represent H, a hydroxy group, or a hydrocarbon group, in which -CH- included in the hydrocarbon group may be replaced by -O- or -CO-; m and n each independently represent 1 or 2; and Arand Areach independently represent a substituted/unsubstituted aromatic hydrocarbon group or a substituted/unsubstituted hetero aromatic hydrocarbon group.SELECTED DRAWING: None
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2016081933A
Publication Date:
September 16, 2020
Filing Date:
April 15, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D321/10; C07D339/08; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2012097074A | ||||
| JP2009084573A | ||||
| JP2003342254A | ||||
| JP2011201860A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation