置換2,5-ジアミノ-3-ヒドロキシヘキサンの製造方法

Japanese Patent JP4172717

B2

Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.

Timothy El Stack
Francis AJ Cardesky
Linda M. Rigiyusky
Daniel D'Abrieu Novetsk
David Scarpetei
The En-Hee Jay Tayen
Mycle S. Allen
Denton Sea Lang Ritz
Laura Meltier
Daniel S. Renault
Hin Ryuen Siam
Chiang Zao
Anthony Earl Hate
M Robert Lina
Howard E Morton
Timothy A. Robbins
Thomas the ray sawin

JP2006052376A

October 29, 2008

February 28, 2006

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ABBOTT LABORATORIES

C07C213/00; C07C213/08; C07C215/28; C07C225/16; C07C227/18; C07C229/36; C07C231/12; C07C233/35; C07C251/40; C07C255/27; C07C255/42; C07C269/06; C07C271/20; C07D209/44; C07D221/14

JP9504024A
JP4308574A

Yoshio Kawaguchi

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