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Title:
METHOD FOR ANALYZING POLYMERIC MATERIAL STRUCTURE AND POLYMERIC MATERIAL
Document Type and Number:
Japanese Patent JP2022144107
Kind Code:
A
Abstract:
To obtain a high-contrast image in a method for analyzing a polymeric material structure using an electron beam or a radiation imaging device.SOLUTION: A method for analyzing a polymeric material structure includes the steps of: cleaning a polymeric base material; irradiating the polymeric base material after cleaning with radiation in a state immersed in a radiation contrast agent containing a radical reactive monomer and graft-polymerizing the polymeric base material and the radical reactive monomer by a radical reaction to obtain the polymeric material. The radical reactive monomer has a heavy element whose atomic number is equal to or more than chlorine.SELECTED DRAWING: Figure 1

Inventors:
OSHITA JOJI
NAKATANI TOSHIMI
Application Number:
JP2021044974A
Publication Date:
October 03, 2022
Filing Date:
March 18, 2021
Export Citation:
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Assignee:
UNIV HIROSHIMA
International Classes:
G01N23/04; C08F251/02; C08F255/02; C08F283/02
Attorney, Agent or Firm:
Patent Attorney Corporation Maeda Patent Office