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Title:
METHOD AND APPARATUS FOR DEPOSITING MATERIAL
Document Type and Number:
Japanese Patent JP2005320632
Kind Code:
A
Abstract:

To provide a method for depositing a deposition material on parts, and to provide an apparatus for depositing the material on a workpiece.

Physical vapor deposition is augmented by chemical vapor deposition from one or more organometallic compounds to deposit multi-component materials. The organometallic compounds may be carbonyls. The process may be used to deposit coatings and repair material on superalloy turbine engine parts. An apparatus for depositing material (110 and 212) on a workpiece (20 and 210) comprises: a deposition chamber (50); a means (62) for vaporizing one or more first deposition material components; a means (64, 200, 220, 240, 250 and 280) for vaporizing one or more organometallic compounds for providing one or more second deposition material components; and a control system (130) coupled to the means for vaporizing one or more first deposition material components and the means for vaporizing one or more organometallic compounds and programmed so as to provide feedback loop control of codeposition of the first and second deposition material components to the workpiece.


Inventors:
MAKHOTKIN ALEXANDER V
MALASHENKO IGOR S
BELOUSOV IGOR V
Application Number:
JP2005131215A
Publication Date:
November 17, 2005
Filing Date:
April 28, 2005
Export Citation:
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Assignee:
UNITED TECHNOLOGIES CORP
International Classes:
F01D5/28; C23C14/00; C23C14/04; C23C14/06; C23C14/08; C23C14/14; C23C14/16; C23C14/22; C23C14/24; C23C14/54; C23C16/16; C23C16/18; C23C16/44; F02C7/00; (IPC1-7): C23C16/44; C23C14/22; F02C7/00
Attorney, Agent or Firm:
Tsuyoshi Hashimoto
Tomioka Kiyoshi