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Patent Searching and Data


Title:
METHOD AND APPARATUS FOR DROPLET APPLICATION
Document Type and Number:
Japanese Patent JP2010194465
Kind Code:
A
Abstract:

To correctly recognize the landing position deviation of droplets discharged from a nozzle of a coating head to the prescribed coating range of a substrate and to improve the landing position accuracy.

In a droplet application method, the first projection amount U to the side of an anti-inside area to the first aiming position of a first droplet E1 landed aiming at the first aiming position from the nozzle 11 and the second protrusion amount L to the side of the anti-inside area to the second aiming position of a second droplet E2 landed aiming at the second aiming position from the nozzle 11 are obtained, and the landing position deviation to the coating range of the droplets by the nozzle 11 is obtained on the basis of the first and second protrusion amounts U and L.


Inventors:
Hirano, Azusa
Tsuruoka, Yasuji
Application Number:
JP2009000042731
Publication Date:
September 09, 2010
Filing Date:
February 25, 2009
Export Citation:
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Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
B05D1/26; B05C5/00; B05C11/00; B05D3/00; G02B5/20
Attorney, Agent or Firm:
塩川 修治