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Patent Searching and Data


Title:
METHOD AND APPARATUS FOR FORMING DENSE THIN FILM
Document Type and Number:
Japanese Patent JP2006219610
Kind Code:
A
Abstract:

To provide high-quality coating, molding or grading of a sample surface by carrying out chemical reaction in such a state that a reactive solution on the sample surface is uniformly pressurized to form a film on the surface of a polymer solution and advancing chemical reaction while uniformly applying pressure to the film to form a thin film which is rich in adhesiveness to a substrate, dense and rigid and scarcely causes breakage and has water resistance.

According to the present invention, a polymer solution of silicone oil, silicone rubber, etc., on the surface of a solid sample is irradiated with ultraviolet light in a high-pressure oxidizing gas atmosphere to form an SiO2 film and pressure is uniformly applied to the film. Thereby, curing reaction of the film is further promoted and coating, molding or grading of the sample surface is carried out. The curing reaction occurs by not only curing reaction with ultraviolet light, but also by radiation, plasma, electrolysis, electric charge, catalyst, etc., and pressurization can be carried out by not only gas, but also by liquid, oil, etc.


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Inventors:
MURAHARA MASATAKA
Application Number:
JP2005035353A
Publication Date:
August 24, 2006
Filing Date:
February 14, 2005
Export Citation:
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Assignee:
MURAHARA MASATAKA
International Classes:
C08J7/04; A61F2/14; A61F2/16; B65D23/02; B65D25/14; G02C7/02; C08L101/00