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Title:
METHOD AND APPARATUS FOR FORMING POROUS FILM, AND METHOD AND APPARATUS FOR FORMING FINE SPHERE
Document Type and Number:
Japanese Patent JP3941325
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a method and an apparatus for forming porous film capable of exhibiting stable performance by forming fine spheres having a fixed size.
SOLUTION: A raw material 11 for fine spheres, containing a liquid organometallic compound or a liquid organosilicon compound is formed into fine particles to provide liquid fine particles 15. The resultant liquid fine particles 15 are heated to decompose the liquid organometallic compound or the liquid organosilicon compound, and the decomposed products are cooled to provide the fine spheres 15b. The obtained fine spheres 15b are attached to a semiconductor wafer 18 to form the objective porous film 17 composed of the fine spheres 15b.


Inventors:
Takuya Miyagawa
Application Number:
JP2000089583A
Publication Date:
July 04, 2007
Filing Date:
March 28, 2000
Export Citation:
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Assignee:
Seiko Epson Corporation
International Classes:
B81C99/00; C04B38/06; B01J2/04; C04B38/00; C04B41/45; C23C16/18; C23C18/02; H01L21/31; H01L21/316; (IPC1-7): C04B38/00; B01J2/04; B81C5/00; H01L21/31; H01L21/316; //C23C16/18; C23C18/02
Domestic Patent References:
JP61295209A
JP7016451A
JP5254883A
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa