Title:
METHOD AND APPARATUS FOR FORMING VAPOR-DEPOSITED FILM
Document Type and Number:
Japanese Patent JPS63111170
Kind Code:
A
Abstract:
PURPOSE: To simply accelerate an evaporated substance in a charged state and to firmly stick a vapor-deposited film to a substrate by impressing voltage to electrodes of a prescribed shape placed between a vapor depositing source and the substrate and by vaporizing the source.
CONSTITUTION: Blade-shaped electrodes 3, wiry or fine wiry electrodes are placed between a vapor depositing source 1 and a substrate 2. The source 1 is vaporized by heating with a heater or the like and voltages Va, Vd are impressed to the electrodes 3 and the substrate 2, respectively. A vapor-deposited film sticks firmly to the substrate by the above-mentioned simple method.
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Inventors:
YOSHINO KATSUMI
KYOKANE JUN
KYOKANE JUN
Application Number:
JP25787686A
Publication Date:
May 16, 1988
Filing Date:
October 29, 1986
Export Citation:
Assignee:
YOSHINO KATSUMI
KYOKANE JUN
KYOKANE JUN
International Classes:
C23C14/32; (IPC1-7): C23C14/32
Attorney, Agent or Firm:
Makino Itsuro