To provide a method and apparatus for a heat treatment, capable of efficiently and continuously processing a plurality of substrates by preventing a damage on the substrates or deflection of them which is caused by an abrupt temperature changes or local heating.

There are provided a housing 51 comprising a carry-in post 52 and/or carry-out port 53 of a substrate G, a substrate stage 56 on which the substrate G carried in through the carry-in port 52 of the housing 51 is placed, a circulation drive part 70 to circulate the substrate stage on which the substrate G is placed while keeping it horizontal, and a heating source 54 which is disposed in the housing 51 and bakes the substrate G with applied heat which is circulated by the circulation drive part 70 for gradual approach.