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Title:
METHOD AND APPARATUS FOR INSPECTION OF SUBSTRATE BY USING ROTATING IRRADIATION SOURCE
Document Type and Number:
Japanese Patent JP3238141
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a method and an apparatus for the inspection of a substrate and a cover glass, in which a defect such as a crack or the like on the substrate and a crack on the cover glass covering the substrate can be inspected without dispersion and without visually inspecting the substrate and the cover glass.
SOLUTION: An electromagnetic radiation source 18 generates infrared rays with which a substrate 14 and a cover glass 16 are irradiated at a prescribed azimuth angle Ψ. The azimuth angle Ψ is made variable in such a way that the substrate 14 and the cover glass 16 are irradiated at a plurality of azimuth angles Ψ. The substrate 14 and the cover glass 16 reflect a part of an incident electromagnetic radiation. A radiation detector 22 collects a part of the reflected radiation, and it creates a plurality of images on the basis of it. The images contain an index which expresses a defect on the substrate 14 and a crack on the cover glass 16.


Inventors:
Mau-son, Cho
Chodzko, Richard A.
Application Number:
JP1999000232917
Publication Date:
December 10, 2001
Filing Date:
August 19, 1999
Export Citation:
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Assignee:
TRW INC
International Classes:
H01L31/04; G01N21/88; G01N21/95; G01N21/956; (IPC1-7): G01N21/95; H01L31/04
Attorney, Agent or Firm:
社本 一夫 (外5名)