METHOD AND APPARATUS FOR LIQUID TREATMENT

Japanese Patent JP3245769

B

PROBLEM TO BE SOLVED: To be capable of transferring a nozzle from a waiting position to an operating position while keeping treatment liquid in a regulated state, which is regulated at the waiting position and delivered from the tip of the nozzle.
SOLUTION: When a developing solution feeding nozzle 3 is used, the tip of the nozzle is rendered to be proximate to a periphery surface of a rotating roller 5 at a waiting position (a) and the state of the developing solution 4 delivered from the tip of the nozzle is regulated. Then the tip of the nozzle is rendered to be proximate to a removing means 30 for removing a dummy plate 31 and the like mounted between the waiting position (a) and an operating position (b) of the nozzle 3. The nozzle 3 is transferred from the waiting position (a) to the operating position (b) and a liquid film is formed on a wafer 2 by transferring the nozzle 3 and the wafer 2 relatively.

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Kawasaki, Satoru
Motoda, Kimio

JP1996000249227

November 02, 2001

August 30, 1996

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TOKYO ELECTRON LTD

B05C5/02; B05B15/02; B05D1/26; G03F7/16; G03F7/30; H01L21/027; B05C11/10; B05C5/02; B05B15/02; B05D1/26; G03F7/16; G03F7/30; H01L21/02; B05C11/10; (IPC1-7): B05C5/02; H01L21/027

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