Title:
METHOD AND APPARATUS FOR MASK REPAIR
Document Type and Number:
Japanese Patent JP2023140338
Kind Code:
A
Abstract:
To provide a method, apparatus and computer program for processing of a lithography object.SOLUTION: The present disclosure relates to a method, apparatus and computer program for processing of a lithography object. More specifically, the present invention relates to a method for removing a material, to a corresponding apparatus, to a method for lithographic processing of a wafer, and to a computer program for implementing the methods. A method for processing a lithography object comprises, for example: providing a first gas comprising first molecules; providing a particle beam in a working region of the object for removal of a first material in the working region based at least partly on the first gas, where the first material comprises ruthenium.SELECTED DRAWING: Figure 1
Inventors:
CHRISTIAN FELIX HERMANNS
PETRA SPIES
DANIEL RHINOW
MAXIMILIAN RUMLER
SCHNEIDER HORST
TU FAN
LAURA AHMELS
BENJAMIN HERD
PETRA SPIES
DANIEL RHINOW
MAXIMILIAN RUMLER
SCHNEIDER HORST
TU FAN
LAURA AHMELS
BENJAMIN HERD
Application Number:
JP2023044937A
Publication Date:
October 04, 2023
Filing Date:
March 22, 2023
Export Citation:
Assignee:
ZEISS CARL SMT GMBH
International Classes:
G03F1/74
Attorney, Agent or Firm:
Shinichiro Tanaka
Hiroyuki Suda
Fumiaki Otsuka
Naoki Kondo
Takeo Nasu
Nobuhiko Suzuki
Nobuyuki Taniguchi
Hiroyuki Suda
Fumiaki Otsuka
Naoki Kondo
Takeo Nasu
Nobuhiko Suzuki
Nobuyuki Taniguchi
Previous Patent: JPWO2023140337
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