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Patent Searching and Data


Title:
METHOD AND APPARATUS FOR MEASUREMENT OF TERTIARY NONLINEAR SUSCEPTIBILITY RATE
Document Type and Number:
Japanese Patent JPH10115573
Kind Code:
A
Abstract:

To provide a method in which the tertiary nonlinear susceptibility rate of a powder sample or a film sample is measured and to provide its apparatus.

A rotating base 41 is turned, and a photodiode 40 is retreated to a position which is not disturbing. In succession, a shutter 3 is opened, and a sample is irradiated with a beam 32 and a beam 33. The angle of incidence of the beam 33 is set to be smaller than a total-reflection critical angle. A rotating base 10 is turned, an angle is swept at about 62°C, and an angle at which a signal intensity becomes strongest is searched. At this time, the magnitude of the angle of incidence of a beam 31 is made just equal to that of the angle of incidence of the beam 32m the angle of the rotating base at this time is read out, and a precise angle of incidence is found. On the basis of the angle, a tertiary nonlinear susceptibility rate is found by a computer 16. Consequently, the tertiary nonlinear susceptibility rate of a powder sample or a nonhomogeneous film sample which is hard to measure can be measured.


Inventors:
KIGUCHI MASAFUMI
KATOU MIDORI
Application Number:
JP26961496A
Publication Date:
May 06, 1998
Filing Date:
October 11, 1996
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G01N21/65; G01M11/00; G01N21/27; G01N21/64; (IPC1-7): G01M11/00; G01N21/27; G01N21/65
Attorney, Agent or Firm:
Ogawa Katsuo