Title:
METHOD AND APPARATUS FOR PLASMA TREATMENT
Document Type and Number:
Japanese Patent JP2738809
Kind Code:
B2
Abstract:
PURPOSE: To provide a plasma treatment apparatus which uses plasma effectively to improve the quality of the treated film and to obtain a higher process speed.
CONSTITUTION: The flux density of the magnetic field generated in vacuum containers 2 and 9 by means 1 decreases monotonously with the distance to a susceptor 8. An electron cyclotron resonance position (a) is positioned near the susceptor.
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Inventors:
SUZUKI KAZUO
SUZUKI NOBORU
SONOBE TADASHI
CHIBA ATSUSHI
MONMA NAOHIRO
MOCHIZUKI YASUHIRO
TAKAHASHI SHIGERU
FUKUDA TAKUYA
SUZUKI NOBORU
SONOBE TADASHI
CHIBA ATSUSHI
MONMA NAOHIRO
MOCHIZUKI YASUHIRO
TAKAHASHI SHIGERU
FUKUDA TAKUYA
Application Number:
JP23936693A
Publication Date:
April 08, 1998
Filing Date:
September 27, 1993
Export Citation:
Assignee:
HITACHI SEISAKUSHO KK
HITACHI ENJINIARINGU SAABISU KK
HITACHI ENJINIARINGU SAABISU KK
International Classes:
C23C16/50; C23C16/511; C23F4/00; H01L21/203; H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): H01L21/205; C23C16/50; C23F4/00; H01L21/3065
Domestic Patent References:
| JP6292443A |
Attorney, Agent or Firm:
Ogawa Katsuo