To provide a method and an apparatus for plasma treatment that can reduce spherical protrusions existent on the surface of a functional deposited film, particularly a photosensitive material for electrophotography.
A reaction chamber 1 which can be decompressed is possible is provided with cathodes 2 and a member to hold the both edges of a substrate to be treated. High-frequency power generated by the high-frequency power supply 6 is supplied to the cathodes 2 to generate plasma between the cathodes 2 and the member holding the substrate 3 or the substrate 3 held by the member, subsequently forming a deposited film on the substrate. In this plasma treatment method or apparatus, the length of the cathode 2 is shorter than that of the member holding the substrate 3. The high-frequency power generated by the high-frequency power supply 6 is divided and supplied to each cathode.
YAMAGAMI ATSUSHI
TAKAGI SATOSHI
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