Title:
METHOD AND APPARATUS FOR PLOTTING CHARGED PARTICLE BEAM
Document Type and Number:
Japanese Patent JP3394233
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve accuracy in connection between various graphics in a batch graphic irradiation method.
SOLUTION: In the case of correcting a plotting position on a sample 317 with a batch graphic selection on a second mask 305, a correction quantity is changed, while depending on the deflection quantities of deflectors 311 and 102 for specifying a selected graphic position and the plotting position.
Inventors:
Hiroyuki Takahashi
Yasunari Hayata
Hiroyuki Ito
Kawano Gen
Yasunari Hayata
Hiroyuki Ito
Kawano Gen
Application Number:
JP2000192944A
Publication Date:
April 07, 2003
Filing Date:
June 27, 2000
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
G03F7/20; H01J37/147; H01J37/305; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; H01J37/147; H01J37/305
Domestic Patent References:
| JP10256136A | ||||
| JP2000124113A | ||||
| JP11176737A | ||||
| JP10106470A | ||||
| JP9129544A |
Attorney, Agent or Firm:
Yuusuke Hiraki