Title:
METHOD AND APPARATUS FOR REDUCING EROSION RATE OF SURFACE EXPOSED TO HALOGEN-CONTAINING PLASMA
Document Type and Number:
Japanese Patent JP2019069891
Kind Code:
A
Abstract:
To provide a ceramic article having durability against erosion by a halogen-containing plasma to be used for semiconductor processing.SOLUTION: The ceramic article comprises a body and a ceramic coating formed on the body. The ceramic coating is resistive to erosion by a halogen-containing plasma. The ceramic coating contains yttrium oxide at a concentration ranging from 55 mol% to 80 mol% and zirconium oxide at a concentration ranging from 20 mol% to 45 mol%.SELECTED DRAWING: Figure 2B
Inventors:
SUN JENNIFER Y
DUAN REN-GUAN
YUAN JIE
XU LI
COLLINS KENNETH S
DUAN REN-GUAN
YUAN JIE
XU LI
COLLINS KENNETH S
Application Number:
JP2018217295A
Publication Date:
May 09, 2019
Filing Date:
November 20, 2018
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
C04B35/488; C04B35/505; C04B41/87; H01L21/3065
Domestic Patent References:
| JP2000001362A | 2000-01-07 | |||
| JP2004269951A | 2004-09-30 |
Attorney, Agent or Firm:
Yoshiaki Anzai