METHOD AND APPARATUS FOR REGENERATING ION EXCHANGE RESIN, AND COPPER ETCHING LIQUID REGENERATING APPARATUS USING THE SAME

Japanese Patent JP2013188720

A

To reduce energy, cost and time required for regenerating acid for regenerating ion exchange resin.

An ion exchange resin regenerating process for eliminating copper from ion exchange resin that adsorbs copper by acid containing copper at a concentration higher than 14 ppm, and a copper eliminating process for eliminating copper contained in the acid by a copper eliminating means, are carried out to shorten time required for regenerating acid compared with the case of eliminating copper to the degree of refined acid in a copper eliminating process to thereby achieve an effect of reducing energy and cost. This results in providing a method and an apparatus for regenerating ion exchange resin that can reduce the amount of newly added acid and a treatment cost for the disposal of acid, and a copper etching liquid regenerating apparatus using the method and apparatus.

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YOSHIDA SHINJI
KUROBA TOMOHIRO
NIWA KAZUHIRO
UMEZAWA HIROYUKI
TASHIRO YOSHIKAZU

JP2012058294A

September 26, 2013

March 15, 2012

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PANASONIC CORP

B01J45/00; B01J49/00; C02F1/42; C02F1/461; C23F1/46

Hiroki Naito
Daisuke Nagano
Kentaro Fujii

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