Title:
METHOD AND APPARATUS FOR REMOVAL OF OXIDE FILM IN PRETREATMENT OF OXYGEN ANALYSIS
Document Type and Number:
Japanese Patent JP3251457
Kind Code:
B2
Abstract:
PURPOSE: To provide an oxygen-analytical-sample polishing method and its apparatus by which even a high-hardness sample such as a high-carbon material or the like can be punched easily and by which a trace oxygen amount in iron and steel can be measured precisely.
CONSTITUTION: In the case of a sample 1 whose hardness is high, a sample piece 3 which has been cut is high-frequency-heated 9, it is softened, and a punched sample 5 is then prepared by a punching press. In succession, the sample is polished coarsely by a sand blast 10. An oxide film on the surface of the sample is removed by an HCl-FeCl3-CH3OH electrolytic solution in an electrolytic polishing operation 11 in which a cathodic oxidation operation and an anodic oxidation operation are repeated, an ultrasonic cleaning operation 12 is performed, and the sample is conveyed to an oxygen analyzer via a drying process 7.
Inventors:
Ono
Application Number:
JP5623595A
Publication Date:
January 28, 2002
Filing Date:
March 15, 1995
Export Citation:
Assignee:
Nippon Steel Corporation
International Classes:
G01N31/00; G01N1/28; G01N1/32; G01N1/36; G01N33/20; (IPC1-7): G01N33/20; G01N1/28; G01N1/32; G01N1/36
Domestic Patent References:
| JP3150462A | ||||
| JP6147561A | ||||
| JP6155166A | ||||
| JP63179233A |
Attorney, Agent or Firm:
Yu Shiina (1 person outside)