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Title:
METHOD AND APPARATUS FOR SUPPLYING SAMPLE IN ICP LIGHT EMITTANCE ANALYSIS
Document Type and Number:
Japanese Patent JPH05288682
Kind Code:
A
Abstract:

PURPOSE: To evaporate a sample at a high temperature and to make it possible to supply a sufficient absolute amount of elements to be analyzed into a plasma torch part by providing an electrode, which is arranged at a position facing an inductive container or a rotary electrode, a power supply, which causes arc discharging between the electrodes, and a carrier gas feeding means, which feeds the evaporated sample into the plasma torch part.

CONSTITUTION: A container 2A containing a sample to be analyzed 1 and an electrode 3 are arranged in a case body 10. A power supply 4, which causes arc discharging between the container 2A and the electrode 3, is connected to the container 2A and the electrode 3. Argon gas is supplied into the case body 10 through a pipe 7 from a cylinder 5 of the argon Ar gas. The gas is sent into a plasma torch part 6 through a pipe 8 together with the steam sample, which is evaporated from the sample 1 with the heat caused by the arc discharging between the container 2A and the electrode 3. The sample is provided for the light emitting spectrochemical analysis. The Ar gas is also supplied into the plasma torch part 6 by way of another pipe 9 from the cylinder 5.


Inventors:
NARITA MASANAO
Application Number:
JP8413892A
Publication Date:
November 02, 1993
Filing Date:
April 06, 1992
Export Citation:
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Assignee:
DAIDO STEEL CO LTD
International Classes:
G01N1/22; G01N21/73; (IPC1-7): G01N21/73; G01N1/22
Attorney, Agent or Firm:
Sou Suga



 
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