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Title:
METHOD AND APPARATUS FOR TREATING ACIDIC TREATMENT LIQUID AND METHOD FOR PRODUCING SUPPORT FOR LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
Japanese Patent JP2002239554
Kind Code:
A
Abstract:

To provide a treatment method for an acidic treatment liquid which can eminently reduce the discharge of waste liquid, can effectively remove metal ions, and can largely curtail the consumption of nitric acid, to provide a treatment apparatus for the method, and a production method for a support for a lithographic printing plate with the use of the treatment method.

The treatment method includes a sulfuric acid addition process in which to an acidic treatment liquid containing nitric acid and/or hydrochloric acid and non-alkali metal ions, sulfuric acid in an amount corresponding to the content of the non-alkali metal ions is added to produce the sulfate of the non-alkali metal and an acidic treatment liquid recovery process in which the sulfate is separated from the acidic treatment liquid added with sulfuric acid in the addition process, and the residual acidic treatment liquid is recovered. The treatment apparatus for the above method and the production method of the support for the lithographic printing plate with the use of the method are provided.


Inventors:
KIMURA TORU
HIROKAWA TSUTOMU
YAMAZAKI TORU
Application Number:
JP2001038159A
Publication Date:
August 27, 2002
Filing Date:
February 15, 2001
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/00; B01D61/44; B01D61/52; B41N1/08; B41N3/03; C01B7/07; C01B21/46; C02F1/42; C02F1/469; C02F1/52; C25F3/04; C25F7/02; G03F7/26; (IPC1-7): C02F1/469; B01D61/52; C02F1/42; C02F1/52; C25F3/04; C25F7/02; G03F7/00; G03F7/26
Attorney, Agent or Firm:
Atsushi Nakajima (3 outside)