Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD OF APPLYING PHOTOSENSITIVE LIQUID FOR MANUFACTURING PHOTOSENSITIVE PRINTING PLATE
Document Type and Number:
Japanese Patent JPH02165149
Kind Code:
A
Abstract:

PURPOSE: To prevent a bubble fault by applying a photosensitive liquid with an extruding nozzle for extruding the photosensitive liquid from a slit running along a lateral direction.

CONSTITUTION: When in an extruding nozzle 20, a photosensitive liquid L from a photosensitive liquid tank 7 is fed forcedly through a filter 9 by a pump 8, the photosensitive liquid L flows out of a slit 22, while extending over the whole width of a pocket 23. The photosensitive liquid L allowed to flow out is applied to an applicator roll 2, and thereafter, transferred onto a supporting body B. In such a manner, when the photosensitive liquid is supplied to the applicator roll 2 by the extruding nozzle 20, as long as the photosensitive liquid is offered at constant supply speed, not only the fluctuation of primary film thickness can be prevented but also the factor of generation of a bubble is eliminated completely, therefore, a bubble fault can be prevented surely.


Inventors:
FUKAZAWA KOJI
KOBAYASHI SHIGERU
SUZUKI YASUYUKI
GOTO SEI
Application Number:
JP32085388A
Publication Date:
June 26, 1990
Filing Date:
December 20, 1988
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KONISHIROKU PHOTO IND
International Classes:
G03F7/16; B05D1/28; (IPC1-7): B05D1/28; G03F7/16
Domestic Patent References:
JPS63231353A1988-09-27
JPS5695363A1981-08-01
JPS62110776A1987-05-21
Attorney, Agent or Firm:
Yoshihisa Nagai