METHOD FOR CALCULATING POSITIONAL DISTORTION OF PATTERN

Japanese Patent JP3292909

B2

PROBLEM TO BE SOLVED: To simulate the positional shift of a pattern formed on an absorbing body more easily 'by calculating the displaced state of pattern while assuming that the absorbing body has film thickness distribution corresponding to the density distribution of pattern.
SOLUTION: Assuming that a punched pattern and a boundary are not present in a region for calculating distortion but the film thickness is decreasing uniformly over the entire area, a differential equation for balance can be solved very easily without employing a boundary condition formula. When this method is employed, any intricate pattern can be handled as a variation of film thickness corresponding to the density so long as the density is known. Displaced state of pattern is calculated assuming that the absorbing body has film thickness distribution corresponding to the density distribution of a pattern to be formed thereon. Consequently, the positional shift of pattern can be simulated more easily even for an intricate pattern without requiring an intensive labor for obtaining a solution.

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WO/2003/054577	METHOD FOR LOCALIZING A TARGET IN AN OBJECT

Masatoshi Oda
Shingo Uchiyama
Masato Matsuda

JP2660496A

June 17, 2002

February 14, 1996

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Nippon Telegraph and Telephone Corporation

G01B15/00; G01B21/32; G03F1/22; H01L21/027; (IPC1-7): G01B15/00; G03F1/16; H01L21/027

JP5335217A
JP9306812A
JP7307280A
JP8203817A
JP63200530A

Masaki Yamakawa

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