To calibrate and form a mathematical model to estimate the temperature of a substance to be treated.
A method for forming a temperature estimated mathematical model for the thermal treating device formed that the output of a temperature sensor situated in a heating furnace is applied for a temperature estimated mathematical model to estimate the temperature of a wafer, and the heating furnace is controlled according to an estimated temperature. N-sets of temperature sensors are situated in positions of R1...Rn where a distance from a wafer center satisfies a formula 1. The wafers are contained in the heating furnace and by obtaining the outputs of the sensor of the heating furnace and the output of the sensor of a wafer, a temperature estimated mathematical model is produced. Through similar processing, a relation between an actual measurement and an estimated value is determined to calibrate the temperature estimated mathematical model. Formula 1 is K1.πR12=...=Kn+1.π(R2-Rn2), where K1-Kn+1 is a yield of an element with which a distance from a wafer center is obtained from n+1 regions intercepted by a circle of R1-Rn.
SUZUKI FUJIO
SAKAMOTO KOICHI
YASUHARA MOYURU
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