Title:
METHOD FOR CLEANING ARTICLE AND DEVICE FOR THE SAME
Document Type and Number:
Japanese Patent JP2003053280
Kind Code:
A
Abstract:
To provide a method for cleaning articles and a device for the same without using environmental pollutants.
A polymer resist film or materials to be removed are removed by bringing a potassium oxide aqueous solution 2 into contact with a silicon substrate 10 stuck with the polymer resist film or articles stuck with the materials to be removed.
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Inventors:
SAWADA SHIGEMI
SAKURAGI SHUNICHI
SAKURAGI SHUNICHI
Application Number:
JP2001246886A
Publication Date:
February 25, 2003
Filing Date:
August 16, 2001
Export Citation:
Assignee:
SAWADA SHIGEMI
International Classes:
B08B3/08; B08B3/02; B08B3/10; B08B3/12; C11D3/04; C11D7/04; C11D17/08; H01L21/304; (IPC1-7): B08B3/08; B08B3/02; B08B3/10; B08B3/12; C11D3/04; C11D7/04; C11D17/08; H01L21/304
Attorney, Agent or Firm:
Masao Shibata
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