Title:
METHOD OF CLEANING CMP PAD CONDITIONING DISK
Document Type and Number:
Japanese Patent JP2005039293
Kind Code:
A
Abstract:
To provide a method of cleaning a CMP (Chemical Mechanical Polishing) pad conditioning disk which regenerates a life-expired CMP pad conditioning disk to reduce the cost thereof and to extend the life thereof.
The method of cleaning the CMP pad conditioning disk comprises (1) a step for soaking the CMP pad conditioning disk which was already used in the CMP process in a predetermined chemical to remove a membranous by-product present between the polishing grains, (2) a step for cleaning the conditioning disk from which the membranous by-product is moved with a deionized water and (3) a step for drying the cleaned conditioning disk.
Inventors:
CHO SUNG-BUM
CHOI BAIK-SOON
KIM JIN-SUNG
SAI KEISO
CHOI BAIK-SOON
KIM JIN-SUNG
SAI KEISO
Application Number:
JP2004288276A
Publication Date:
February 10, 2005
Filing Date:
September 30, 2004
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
B24B53/017; B24B53/12; B24D3/00; B24D3/06; B24D7/00; B24D7/06; B24B53/14; B24D7/14; B24D18/00; H01L21/304; (IPC1-7): H01L21/304
Attorney, Agent or Firm:
Masaki Hattori
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