METHOD FOR CLEANING COMPONENT AND UNIT

Japanese Patent JP2001246339

A

To more efficiently clean components and units of used OA equipment when it is reused.

This method for cleaning the equipment and the components and units of the equipment comprises at least the following four steps. The four steps are an application step to uniformly apply a cleaning liquid containing at least a fluorescent brightener to the place to be cleaned, a cleaning step to clean the place to be cleaned, an evaluation step to evaluate the cleanliness of the surface of the place to be cleaned by the intensity of the fluorescence which the fluorescent brightener remaining on the place to be cleaned emits when the place to be cleaned is irradiated with ultraviolet rays after the cleaning step and a selection step to select the succeeding work to be done according to the cleanliness obtained by the evaluation step. A device and a method for automatically cleaning the equipment and the components and units of the equipment by using the principle of this method are also provided.

WO/2006/096814	METHOD AND SYSTEM FOR PROCESSING SUBSTRATES WITH SONIC ENERGY THAT REDUCES OR ELIMINATES DAMAGE TO SEMICONDUCTOR DEVICES
JP2910761	The cleaning method inside piping of semiconductor device manufacture equipment
JPS6341855	DRY CLEANING METHOD FOR PHOTOMASK

SATO FUMIYOSHI
OKAZAWA MASATAKE
IWAMA HIDEO

JP2000000063643

September 11, 2001

March 08, 2000

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CANON KK

B08B7/00; B08B3/04; B08B5/02; B08B7/04; B24C1/00; B24C11/00; (IPC1-7): B08B7/00; B08B3/04; B08B5/02; B08B7/04; B24C1/00; B24C11/00

金田 暢之 (外2名)

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