To provide a method of cleaning a contaminated glass surface, which can polish the glass surface stuck thereto with deposition from water, so as to finish the glass surface to be clear in a short time without scratching the glass surface.
In a method of cleaning a glass surface contaminated with deposition of inorganic substance in water, a polishing pad carrying thereon a polishing agent mainly composed of aluminosilicate substance particles having a grain size of 0.02 μm and substantially excluding particles having a grain size greater than 0.1 μm, and formed of nonwoven fabric made of synthetic fibers, is pressed against the glass surface in order to polish the glass surface. In particular, the polishing is made in such a way the pressure of the polishing pad having a diameter from 15 to 25 cm, against the glass surface is maintained in a range from 0.1 to 0.3 N/cm2 while the peripheral speed of the pad is set to 50 to 1,500 m/min.
ANDO MASARU
Next Patent: POLISHING PAD