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Title:
METHOD FOR CLEANING OFF CONTAMINANT ON SOLID MATTER SURFACE
Document Type and Number:
Japanese Patent JPH0751646
Kind Code:
A
Abstract:

PURPOSE: To clean off the contaminant on the surface of a solid matter and to prevent the deposition of contaminant by loading an optical semiconductor particle on the surface of a solid matter likely to be contaminated by the adhesion of org. matter in the air and then irradiating the surface with a light contg. UV to decompose the org. matter adhered on the solid matter surface.

CONSTITUTION: An optical semiconductor particle is applied on the surface of a solid matter likely to be contaminated with the org. matter in the air or the particle is blown against the surface, and then the surface is dried to carry the particle. The particle on the surface is then irradiated with a light of wavelength having an energy above the band gap of the particle. A light contg. UV is cited as the light, and the dose, irradiation time, etc., are set in conformity to the amt. of org. matter to be treated. The org. matter in the air, the fat secreted from the animal skin, etc., are decomposed in this way.


Inventors:
Murasawa, Sadao
Teramoto, Shigure
Application Number:
JP1993000222169
Publication Date:
February 28, 1995
Filing Date:
August 12, 1993
Export Citation:
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Assignee:
ISHIHARA SANGYO KAISHA LTD
International Classes:
B01J21/06; B01J35/02; B08B7/00; C03C17/23; H01L21/304; (IPC1-7): B08B7/00; B01J21/06; H01L21/304